~ Participates in Ultra Clean Processing of Semiconductor Surfaces Symposium, Ghent Belgium ~
RASIRC®, the leader in high purity vapor delivery, announced that the company will be presenting the poster "New Chemical Vapor Delivery Systems for Surface Cleaning" and exhibiting at the upcoming 11th International UCPSS Symposium, September 16-19, 2012 in Ghent, Belgium. The RASIRC poster highlights the benefits and advantages of a new vapor delivery system that operates at a low temperature, while still effectively delivering several chemistries needed to remove carbon and oxidize surfaces. RASIRC's initial focus has been on vapor phase delivery of H2O2/H2O, NH3/H2O, and Isopropanol/H2O mixtures.
"We now can deliver liquid sourced vapors to enable the process transfer from wet to dry cleaning with minimal changes to the actual process molecules. With the addition of hydrogen peroxide, we can deliver dry SCI and SCII chemistries in consistent compositions, temperatures, and pressures," said Jeff Spiegelman, president and founder of RASIRC. "This new delivery technology will enable process engineers to continue progress on Moore's Law, where wet cleaning is no longer effective."
For more details on this new technology, download the paper "New Chemical Vapor Delivery Systems for Surface Cleaning" from the RASIRC web site at www.rasirc.com/resources/whitepapers/whitepaper-chemical-vapor-for-cleaning.pdf.
